The junction field-effect transistor action. It was previously emphasized that one of the main properties of the bipolar transistor is that it is a current-controlled amplifying device; the output current is controlled by a small input current. In the case of the field-effect transistor (FET) it is the input voltage which controls the output current. The current drawn by the input is usually negligible. This is a great advantage where the signal comes from a device such as capacitor microphone or piezoelectric transducer, which is unable to supply a significant current. FET’s are basically of two types: the junction field-effect transistor (JFET) and the insulated gate field-effect transistor (IGFET). The latter is more commonly known by a name metal-oxide semiconductor field-effect transistor (MOSFET).
At a point along the bar a region of p-type silicon forms a p-n junction. In normal operation, the junction is reverse-biased. The lower contact on the bar is called the source and the upper contact the drain. The electron current flows from source to drain and is controlled by the voltage applied to the p-region called the gate.
An alternative type of construction is the p-channel device where the gate is made of n-type material.
The operation of the JFET depends upon variations in the size of the depletion layer at the reverse-biased gate junction. The p-type gate is much more heavily doped than the n-type bar, so that the depletion region exists almost entirely in the bar. The gate carries a negative bias voltage relative to the source which give rise to the particular shape of the depletion region: this is wider at the top than the bottom. The wider the depletion layer, the narrower the channel there is available for the flow of electrons from source to drain, since the depletion region itself being devoid of current carries, behaves like an insulator.
Unlike the bipolar transistor, the FET employs only majority carriers for its operation. It is therefore sometimes called the unipolar transistor and is less susceptible than the bipolar type to temperature changes and nuclear radiation.
Пошаговое объяснение:
1) 43 дм³- 59 см³=42 941 см³=42,941 дм³
1 дм³= 1000 см³
43 дм³=43 000 см ³
43000см³-59 см³=42 941 см³=42,941 дм³
2) 74 м³- 145 дм³=73,855 м³
1 м³=1000 дм³
74 м³=74 000 дм³
74 000-145=73 855 дм³=73,855 м³
3) 50 см³ - 35 мм³=49,965 см³
1 см³=1000 мм³
50 см³=50 000 мм³
50 000-35=49 965 мм³= 49,965 см³
4) 10 см³ - 63 мм³=10 000 мм³-63 мм³=9937 мм³=9,037 см³
5) 1 м³- 4750 см³= 995 250 см³=0,99525 м³
1 м³= 1 000 000 см³
1 000 000 - 4750=995 250 см³
6) 69 см³-609 мм³=69000-609=68 391 мм³=68,391 см³
The junction field-effect transistor action. It was previously emphasized that one of the main properties of the bipolar transistor is that it is a current-controlled amplifying device; the output current is controlled by a small input current. In the case of the field-effect transistor (FET) it is the input voltage which controls the output current. The current drawn by the input is usually negligible. This is a great advantage where the signal comes from a device such as capacitor microphone or piezoelectric transducer, which is unable to supply a significant current. FET’s are basically of two types: the junction field-effect transistor (JFET) and the insulated gate field-effect transistor (IGFET). The latter is more commonly known by a name metal-oxide semiconductor field-effect transistor (MOSFET).
At a point along the bar a region of p-type silicon forms a p-n junction. In normal operation, the junction is reverse-biased. The lower contact on the bar is called the source and the upper contact the drain. The electron current flows from source to drain and is controlled by the voltage applied to the p-region called the gate.
An alternative type of construction is the p-channel device where the gate is made of n-type material.
The operation of the JFET depends upon variations in the size of the depletion layer at the reverse-biased gate junction. The p-type gate is much more heavily doped than the n-type bar, so that the depletion region exists almost entirely in the bar. The gate carries a negative bias voltage relative to the source which give rise to the particular shape of the depletion region: this is wider at the top than the bottom. The wider the depletion layer, the narrower the channel there is available for the flow of electrons from source to drain, since the depletion region itself being devoid of current carries, behaves like an insulator.
Unlike the bipolar transistor, the FET employs only majority carriers for its operation. It is therefore sometimes called the unipolar transistor and is less susceptible than the bipolar type to temperature changes and nuclear radiation.
Пошаговое объяснение: